Preparation of Light-Emitting Ytterbium-Doped Tantalum-Oxide Thin Films Using a Simple Co-Sputtering Method

Light-emitting ytterbium-doped tantalum-oxide thin films were prepared using a simple co-sputtering method for the first time. Sharp photoluminescence peaks having a wavelength of around 980 nm were observed from films annealed from 700 ̊C to 1000 ̊C for 10 to 40 min. The strongest intensity of the 980-nm peak was obtained from a film deposited using three ytterbium-oxide pellets and annealed at 800 ̊C for 20 min. Such rare-earth doped tantalum-oxide sputtered films can be used as high-refractive-index materials of autocloned photonic crystals that can be applied to novel light-emitting devices, and they will also be used as both anti-reflection and down-conversion layers for realizing high-efficiency silicon solar cells.